本論文之研究目的在針對細長圓柱件與繞射元件兩類難拋光工件研製以非接觸式拋光法為基礎之精密拋光系統以進行其表面粗糙度的改善。除設計製作特殊之拋光系統外亦探討各項拋光參數如拋光磨料種類、粒度、濃度、拋光間隙等對圓柱件與繞射元件的表面粗糙度改善情況，及材料移除率間之關係。研究結果顯示，對圓柱件之拋光系統：拋光系統內孔的安排會影響加工效率，15度內孔的拋光具有較佳之加工效率、提高拋光液濃度亦能增進表粗改善率。至於繞射元件之拋光系統：使用UV膠進行繞射元件拋光能在減低破壞繞射元件之形狀精度的前提下改進V溝之表面粗糙度。 This research aimed to develop precision polishing systems for improving the surface finish of long fine cylinder and diffractive optical element (DOE) based on the non-contact polishing process. Apart from design and development of the polishing systems, the related polishing parameters such as slurry concentration, abrasive size, polishing gap were correlated to the obtained surface roughness, form accuracy and material removal rate. The results showed that in the case of cylinder polishing-- the fifteen degree inner holes exhibited better surface roughness improve rate (SRIR) than that of vertical holes. As to the case of DOE polishing system, the UV-cured polishing molds demonstrated good SRIR of the V-grooves without giving in too much form accuracy.
