本研究共分為四個部份，包含：(a)在改變不同電壓，濃度，溫度下之陽極氧化的行為，(b)進行多次陽極氧化處理對陽極氧化鋁模板的影響，(c)加入中介層鈦之矽基鋁膜的陽極氧化行為，(d)利用電化學沉積，濺鍍，熱蒸鍍這三種沉積法在氧化鋁模板上作沉積。 在改變不同電壓，濃度和溫度下所得到的陽極氧化鋁的孔洞大小的會隨著電壓呈線性成長，而改變濃度和溫度對孔洞大小的影響不大。在硫酸參數下進行多次陽極氧化處理的孔洞大小都約10nm，週期性和孔洞大小沒隨著多次陽極氧化處理而改變，而草酸及磷酸參數有顯著的改變。Al-Si 和Al-Ti-Si的電流曲線在剛形成氧化鋁下降的低點相近，而有加入鈦層的氧化反應較快。濺鍍和熱蒸鍍沉積法會從氧化鋁模板表面沉積形成鎳金屬層，而電化學沉積法較易於進入孔洞內沉積因而形成鎳奈米柱。 This research is divided into four parts,including (a) anodization behavior of changing different applied voltage,solution concentration and growth temperature,(b) the effect of multi-step anodization on anodic aluminum oxide templates, (c) anodization behavior of Al film on Si substrates with Ti interlayer, (d) depositing Nickel on anodic aluminum oxide templates by electro-deposition,thermo-coater and sputtering. Nanopores present growing up with the applied voltage linearly but the effect of solution concentration and growth temperature is not apparent. Nanopore size is about 10nm by multi-step anodization under the sulphuric acid parameter and the period or pore size has not changed as multi-step anodization,but oxalic acid and phosphoric acid parameter have apparent changes. I-T curve of Al-Si and Al-Ti-Si dropped to begin is very close and reaction of Al-Ti-Si is relatively faster than Al-Si. Nickel metal layer is formed from the anodic alumina oxide template surface by sputtring and thermo-coater method,but electro-deposition method is easy to deposition into pore and formed Nickel nanorod.
