此一研究為使用X-光反射率以及高解析X-光繞射方式來觀察藉由原子沉積系統所成長於藍寶石基板上的氧化鋅薄膜結構。如同我們所知道的，X-光反射率以及高解析X-光繞射的量測用於探索薄膜結構資訊是非常理想且適用的，例如膜的厚度、粗糙度以及密度。在此研究當中，所量測出來的表面與介面形態特徵會與氧化鋅薄膜的厚度有關係，並且觀察出在每塊研究的薄膜中，於藍寶石基板與氧化鋅薄膜之間都存有一層介面層。從phi掃描的量測，也呈現出每塊樣品都具有六角型對稱特性。 Using x-ray reflectivity and high resolution x-ray diffraction, I report the structural studies of ZnO thin films which were epitaxially grown on sapphire from few to thousands atomic layers by atomic layer deposition (ALD). As well known, x-ray reflectivity and diffraction measurements are ideal for probing the structural information of films, such as the thickness, roughness and densities of layers. In this study, I measured the surface and interface morphological characteristics as a function of thickness of ZnO films. I also observed the existence of a diffusion layer between the substrate and ZnO film in all the studied films. From the phi-scan, all the samples shows the hexagonal symmetry.
