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    題名: Advanced field-measurement method with three orthogonal Hall probes for an elliptically polarizing undulator
    作者: Hwang, C. S.;Fan, T. C.;Lin, F. Y.;Yeh, Shuting;Chang, C. H.;Chen, H. H.;鄭伯昆;Tseng, P. K.
    貢獻者: 淡江大學物理學系
    關鍵詞: elliptically polarizing undulators;three-orthogonal-Hall-probe assembly;planar Hall effect
    日期: 1998-05
    上傳時間: 2009-12-31 10:31:38 (UTC+8)
    出版者: International Union of Crystallography
    摘要: link to html
    Advanced field-measurement method with three orthogonal Hall probes for an elliptically polarizing undulator


    C.-S. Hwang, T. C. Fan, F. Y. Lin, S. Yeh, C. H. Chang, H. H. Chen and P. K. Tseng
    A three-orthogonal-Hall-probe assembly with an `on the fly' mapping method has been developed to characterize an elliptically polarizing undulator (EPU). The underlying design concept is that it can measure the three real field components without any field correction under a reliable and synchronization measurement method. Therefore, the relative central position shift, orthogonal angle and the planar Hall effect error between the three Hall probes should be calibrated and readjusted. Experimental results demonstrate that this method can yield an r.m.s. reproducibility of 10 G cm for the three field components and 2 G for the peak field strength. Under precision conditions this system can completely measure the three on-axis field components within 2 min for a 4 m-long EPU.
    關聯: Journal of Synchrotron Radiation 5(3), pp.471-474
    DOI: 10.1107/S0909049597013691
    顯示於類別:[物理學系暨研究所] 期刊論文

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