English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 49074/83182 (59%)
造訪人次 : 6968390      線上人數 : 60
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋
    請使用永久網址來引用或連結此文件: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/27618


    題名: Bonding properties and their relation to residual stress and refractive index of amorphous Ta(N,O) films investigated by x-ray absorption spectroscopy
    作者: Jan, J. C.;Babu, P. D.;Tsai, H. M.;Pao, C. W.;Chiou, J. W.;Ray, S. C.;Krishna Kumar, K. P.;彭維鋒;Pong, W. F.;Tsai, M. H.;Jong, C. A.;Chin, T. S.
    貢獻者: 淡江大學物理學系
    關鍵詞: tantalum compounds;thin films;amorphous state;internal stresses;refractive index;EXAFS;XANES
    日期: 2005-04-18
    上傳時間: 2009-12-31 10:30:17 (UTC+8)
    出版者: College Park: American Institute of Physics
    摘要: This work presents N, O K-edge x-ray absorption near-edge structure (XANES) and Ta L3-edge extended x-ray absorption fine structure (EXAFS) studies of amorphous Ta(N,O) films prepared with various flow rate ratios of N2/O2. The N and O K-edge XANES and Ta L3-edge EXAFS spectra demonstrate the presence of N2 molecules. These spectra also show that Ta(N,O) films have similar local atomic structure as that of Ta2O5. No evidence of the formation of Ta–N bond was obtained. The intensities of the π* feature in the N K-edge spectra and the features of O 2p–Ta 5d hybridized states were found to correlate with the residual stress and the refractive index, respectively.
    關聯: Applied Physics Letters 86(16), pp.161910(3pages)
    DOI: 10.1063/1.1905784
    顯示於類別:[物理學系暨研究所] 期刊論文

    文件中的檔案:

    檔案 描述 大小格式瀏覽次數
    0003-6951_86(16)p161910-161912.pdf68KbAdobe PDF710檢視/開啟
    index.html0KbHTML90檢視/開啟

    在機構典藏中所有的資料項目都受到原著作權保護.

    TAIR相關文章

    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - 回饋