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    题名: Bonding properties and their relation to residual stress and refractive index of amorphous Ta(N,O) films investigated by x-ray absorption spectroscopy
    作者: Jan, J. C.;Babu, P. D.;Tsai, H. M.;Pao, C. W.;Chiou, J. W.;Ray, S. C.;Krishna Kumar, K. P.;彭維鋒;Pong, W. F.;Tsai, M. H.;Jong, C. A.;Chin, T. S.
    贡献者: 淡江大學物理學系
    关键词: tantalum compounds;thin films;amorphous state;internal stresses;refractive index;EXAFS;XANES
    日期: 2005-04-18
    上传时间: 2009-12-31 10:30:17 (UTC+8)
    出版者: College Park: American Institute of Physics
    摘要: This work presents N, O K-edge x-ray absorption near-edge structure (XANES) and Ta L3-edge extended x-ray absorption fine structure (EXAFS) studies of amorphous Ta(N,O) films prepared with various flow rate ratios of N2/O2. The N and O K-edge XANES and Ta L3-edge EXAFS spectra demonstrate the presence of N2 molecules. These spectra also show that Ta(N,O) films have similar local atomic structure as that of Ta2O5. No evidence of the formation of Ta–N bond was obtained. The intensities of the π* feature in the N K-edge spectra and the features of O 2p–Ta 5d hybridized states were found to correlate with the residual stress and the refractive index, respectively.
    關聯: Applied Physics Letters 86(16), pp.161910(3pages)
    DOI: 10.1063/1.1905784
    显示于类别:[物理學系暨研究所] 期刊論文

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