Effect of surface treatments on the electronic properties of ultra-nanocrystalline diamond films

淡江大學機構典藏 > 理學院 > 物理學系暨研究所 > 會議論文 > Item 987654321/27477

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題名:	Effect of surface treatments on the electronic properties of ultra-nanocrystalline diamond films
作者:	Dong, C. L.;Chen, S. S.;Chiou, J. W.;Chen, Y. Y.;Guo, J. -H.;Cheng, H. F.;Lin, I. N.;Chang, C. L.
貢獻者:	淡江大學物理學系
關鍵詞:	X-RAY-ABSORPTION;DOPED ULTRANANOCRYSTALLINE DIAMOND;FIELD-EMISSION;SYNCHROTRON-RADIATION;CARBON-FILMS;CVD DIAMOND;NEAR-EDGE;SPECTROSCOPY;EELS
日期:	2008-07
上傳時間:	2009-12-31 10:11:14 (UTC+8)
出版者:	LAUSANNE: Lausanne: Elsevier S.A.
摘要:	We present the soft x-ray spectroscopic study of the ultra-nanocrystal line diamond (UNCD) films with different surface treatments. The samples were prepared by means of microwave plasma enhanced chemical vapor deposition (MPECVD) and the different surface treatments are applied to alter their field emission properties. The electronic properties were subsequently examined by the soft x-ray absorption and x-ray emission spectroscopy at carbon 1s threshold. From the experimental results, there is no significant variation in electronic structure of oxygen- and hydrogen-plasma treated UNCD films. On the other hand, the biased treated UNCD film shows more remarkable change on the sp(2) and sp(3) states. The formation of sp(2) bonding and the reduction of sp(3) bonding are the consequence of the improved electron field emission properties.
關聯:	Proceedings of Diamond 2007, the 18th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide — Diamond 2006, 4p.
顯示於類別:	[物理學系暨研究所] 會議論文

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