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    jsp.display-item.identifier=請使用永久網址來引用或連結此文件: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/27465

    题名: Effect of processing parameters on the nucleation behavior of nano-crystalline diamond film
    作者: 李彥志;Lee, Y. C.;Lin, S. J.;Chia, C. T.;Cheng, H. F.;林諭男;Lin, I-nan
    贡献者: 淡江大學物理學系
    关键词: Nanodiamond;Bias enhanced nucleation and growth;Electron field emission
    日期: 2005-03
    上传时间: 2009-12-31 10:10:32 (UTC+8)
    出版者: Elsevier
    摘要: The nucleation behavior of nanodiamond films and the associated electron field emission properties were investigated. Among the important CVD parameters, the methane/hydrogen ratio and the total pressure impose most markedly effect, whereas the microwave power and the boron content show least significant effect on the nucleation behavior for the nanodiamonds. Presumably, the prime factor modifying the rate of formation of diamond nuclei is the proportion of C+- and H+-species contained in the plasma. The bias voltage applied for nucleation of diamonds show more marked effect on improving the electron field emission capacity for the nanodiamonds than the boron-content does. It is ascribed to the increase in proportion of grain boundaries, as the grain boundaries are highly conductive and are good emission sites.
    關聯: Diamond and Related Materials 14(3-7), pp.296-301
    DOI: 10.1016/j.diamond.2004.10.015
    显示于类别:[物理學系暨研究所] 期刊論文


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