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    請使用永久網址來引用或連結此文件: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/27464

    題名: Structural and electrical properties of nanocrystalline diamond (NCD) heavily doped by nitrogen
    作者: 劉彥崗;Liu, Y. K.;Tso, P. L.;Pradhan, D.;林諭男;Lin, I-nan;Clark, M.;Tzeng, Y.
    貢獻者: 淡江大學物理學系
    關鍵詞: Nanocrystalline diamond;NCD;Nitrogen-doped diamond;Electron field emission;MPECVD
    日期: 2005-11-01
    上傳時間: 2009-12-31 10:10:28 (UTC+8)
    出版者: Elsevier
    摘要: Gas mixtures containing up to 40% nitrogen by volume and 1% CH4 with the balance being argon have been used for the deposition of nitrogen doped nanocrystalline diamond (NCD) films by means of microwave plasma enhanced chemical vapour deposition (MPECVD). The CVD plasma was monitored by optical emission spectroscopy to reveal the plasma species, e.g., CN molecules, as a function of the nitrogen additive. Structural properties of the deposited NCD films were studied by FESEM and Raman spectroscopy. Effects of nitrogen doping on the electrical resistivity and electron field emission characteristics of the NCD films were measured. In this work, correlation between the structural and electrical properties of NCD films and the nitrogen additive to the CVD plasma will be presented and discussed.
    關聯: Diamond and Related Materials 14(11-12), pp.2059-2063
    DOI: 10.1016/j.diamond.2005.06.012
    顯示於類別:[物理學系暨研究所] 期刊論文


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