淡江大學機構典藏:Item 987654321/27462
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    Please use this identifier to cite or link to this item: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/27462


    Title: Effect of surface treatment on the electron field emission property of nano-diamond films
    Authors: 李彥志;Lee, Yen-chih;Pradhan, Debabrata;Lin, Su-jien;Chia, Chih-ta;Cheng, Hsiu-fung;林諭男;Lin, I-nan
    Contributors: 淡江大學物理學系
    Keywords: Electron field emission;Nano-diamond;Surface treatment;Boron doping
    Date: 2005-11
    Issue Date: 2009-12-31 10:10:23 (UTC+8)
    Publisher: Elsevier
    Abstract: Nano-diamond films having grain size around 20 nm were deposited by bias enhanced growth (BEG) method. Different surface treatments were carried out to increase their field emission properties and their effects are clearly noticed. Surface morphology of different surface treated nano-diamond films was examined. There was no significant change in the curve of Raman spectra of different surface treated samples. Raman spectra were typically of similar nature to nano-diamond film. Field emission results were more interesting. Biased in hydrogen plasma treated nano-diamond film has shown best electron emission behavior and low turn-on-field (E0). The turn-on-field of bias-treated nano-diamond film was 19.5 V/μm. The decrease of turn-on-field (∼6 V/μm) of biased treated nano-diamond film from as-grown BEG film was attributed to the formation of thin sp2 layer and more defects on the surface of film by hydrogen ion bombardment. Moreover, hydrogen-plasma treated nano-diamond film was also found to be good for electron emission but there was no improvement in electron emission as in the case of air plasma treated nano-diamond films.
    Relation: Diamond and Related Materials 14(11-12), pp.2055-2058
    DOI: 10.1016/j.diamond.2005.08.059
    Appears in Collections:[Graduate Institute & Department of Physics] Journal Article

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