English  |  正體中文  |  简体中文  |  Items with full text/Total items : 55178/89446 (62%)
Visitors : 10661721      Online Users : 25
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version
    Please use this identifier to cite or link to this item: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/25563

    Title: Atomic Force Microscopy Study of E99P69E99 Triblock Copolymer Chains on Silicon Surface
    Authors: 吳俊弘;Wu, Chunhung;Liu, T.;White, H.;Chu, B.
    Contributors: 淡江大學化學學系
    Date: 2000-01-25
    Issue Date: 2009-12-01 09:00:44 (UTC+8)
    Publisher: American Chemical Society (ACS)
    Abstract: Atomic force microscopy (AFM) was employed to study the formation of Pluronic Polyol F127 oxyethylene99−oxypropylene69−oxyethylene99 (E99P69E99) triblock copolymer micelles on surface-treated silicon substrates. The micellar size determined by dynamic light scattering and small-angle X-ray scattering techniques was 20−30 nm. The two-dimensional micelle size measured by ambient AFM on the modified silicon surfaces was somewhat distorted (20−50 nm in the xy dimension and ∼7 nm in the z dimension) under the environmental conditions present during scanning (i.e., copolymer chain collapsing in air and AFM tip distortion during scanning). Surface treatment was more important than solution concentration for micelle formation on the silicon surfaces. The results could be correlated with the effect of inner capillary surface coating on the resolution of double-stranded DNA capillary electrophoresis by using E99P69E99/1X TBE buffer as the separation medium.
    Relation: Langmuir 16(2), pp.656-661
    DOI: 10.1021/la990729p
    Appears in Collections:[Graduate Institute & Department of Chemistry] Journal Article

    Files in This Item:

    File Description SizeFormat

    All items in 機構典藏 are protected by copyright, with all rights reserved.

    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - Feedback