English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 51756/86971 (60%)
造訪人次 : 8355874      線上人數 : 79
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋
    請使用永久網址來引用或連結此文件: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/25563

    題名: Atomic Force Microscopy Study of E99P69E99 Triblock Copolymer Chains on Silicon Surface
    作者: 吳俊弘;Wu, Chunhung;Liu, T.;White, H.;Chu, B.
    貢獻者: 淡江大學化學學系
    日期: 2000-01-25
    上傳時間: 2009-12-01 09:00:44 (UTC+8)
    出版者: American Chemical Society (ACS)
    摘要: Atomic force microscopy (AFM) was employed to study the formation of Pluronic Polyol F127 oxyethylene99−oxypropylene69−oxyethylene99 (E99P69E99) triblock copolymer micelles on surface-treated silicon substrates. The micellar size determined by dynamic light scattering and small-angle X-ray scattering techniques was 20−30 nm. The two-dimensional micelle size measured by ambient AFM on the modified silicon surfaces was somewhat distorted (20−50 nm in the xy dimension and ∼7 nm in the z dimension) under the environmental conditions present during scanning (i.e., copolymer chain collapsing in air and AFM tip distortion during scanning). Surface treatment was more important than solution concentration for micelle formation on the silicon surfaces. The results could be correlated with the effect of inner capillary surface coating on the resolution of double-stranded DNA capillary electrophoresis by using E99P69E99/1X TBE buffer as the separation medium.
    關聯: Langmuir 16(2), pp.656-661
    DOI: 10.1021/la990729p
    顯示於類別:[化學學系暨研究所] 期刊論文


    檔案 描述 大小格式瀏覽次數



    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - 回饋