English  |  正體中文  |  简体中文  |  Items with full text/Total items : 51491/86611 (59%)
Visitors : 8249468      Online Users : 96
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version
    Please use this identifier to cite or link to this item: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/24951


    Title: Electrochemiacl doping of tetraethylammonium on C60 film
    Other Titles: 以電化學方法植入Tetraethylammonium在C60薄膜中
    Authors: 王文竹;Wang, Wen-jwu;Chiu, Hau-shy;余良杰;Yu, Liang-jye;王伯昌;Wang, Bo-cheng
    Contributors: 淡江大學化學學系
    Date: 1995-03-15
    Issue Date: 2009-12-01
    Publisher: Elsevier
    Abstract: The electrochemical behavior of C60 films, which was prepared on electrode by solution casting method, during redox processes in acetonitrile solution containing tetraethylammonium perchlorate as supporting electrolyte was examined by means of cyclic voltammetry (CV) and electrochemical quartz crystal microbalance (EQCM) technique. In the CV behavior, there are four reductive waves at R1=-1.17 V, R2=-1.25 V, R3=-1.40 V and R4=-1.55 V vsFc/Fc+ which are corresponding to C60(TEA+)/C60-(TEA+), C60/C60, C60 (TEA+)/C60−2 reactions, respectively. There are four reoxidative waves at 04=-1.29 V, 03=-1.06 V, 02=-0.76 V and 01=-0.55 V vs Fc/Fc+ which are corresponding to C60−2 deposition on film, C60-/C60, and C60−2(TEA+)2/C60-(TEA+)/C60(TEA-), respectively. The dissolution/ depositive of C60−n(n=1,2) and doping / dedoping of TEA+ on C60 films at different potential are investigated and approved by EQCM studied.
    Relation: Synthetic metals 70(1-3), pp.1439-1442
    DOI: 10.1016/0379-6779(94)02909-I
    Appears in Collections:[化學學系暨研究所] 期刊論文

    Files in This Item:

    File Description SizeFormat
    0KbUnknown233View/Open
    index.html0KbHTML88View/Open

    All items in 機構典藏 are protected by copyright, with all rights reserved.


    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - Feedback