淡江大學機構典藏:Item 987654321/24937
English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 62805/95882 (66%)
造訪人次 : 3991461      線上人數 : 539
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋
    請使用永久網址來引用或連結此文件: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/24937


    題名: Dissolution and reduction behavior of C60 films
    作者: Wang, Wen-Jwn;Chiu, Hau-Shyi;Yu, Liang-Jyi;Wang, Bo-Cheng
    貢獻者: 淡江大學化學學系
    日期: 1995-03
    上傳時間: 2013-08-08 14:43:20 (UTC+8)
    出版者: Lausanne: Elsevier S.A.
    摘要: Electrochemistry of fullerenes has recently attracted much attention. Films of C60, which was prepared on the electrode by solution casting, exhibit unique voltammetric behavior. Thin films of C60, have been studied by cyclic voltammetry and controlled-potential electrolysis in acetonitrile solutions containing tetraalkylammonium salts (R= CH3, C2H5, C4H9) as supporting electrolytes. The dissolution and redeposition behavior of C60 -n(n=1,2) was investigated by dual electrochemical cells with bipotentialstat. The doping processes were found to be quasi-reversible and dissolution was observed during continuous potential cycling. A fraction of the dissolved C60 anion was redeposited on the second working electrode without applied potential nearby the first working electrode. The cyclic voltammetric behavior of the redeposited C60 films was different from the original films. This behavior may be caused by the different physical state of films which is very thin and porous. The morphology of the redeposited film and original film was investigated by scanning tunneling microscopy.
    關聯: Synthetic Metals 70(1-3), pp.1465-1468
    DOI: 10.1016/0379-6779(94)02920-T
    顯示於類別:[化學學系暨研究所] 期刊論文

    文件中的檔案:

    檔案 描述 大小格式瀏覽次數
    Dissolution and reduction behavior of C60 films.pdf236KbAdobe PDF4檢視/開啟
    index.html0KbHTML220檢視/開啟

    在機構典藏中所有的資料項目都受到原著作權保護.

    TAIR相關文章

    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - 回饋