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    题名: Electeonic structures of group-III-nitride nanorods studied by x-ray absorption, x-ray emission, and Raman spectroscopy
    作者: Pao, C. W.;Babu, P. D.;Tsai, H. M.;Chiou, J. W.;Ray, S. C.;Yang, S. C.;Chien, F. Z.;Pong, W. F.;Tsai, M.-H.;Hsu, C. W.;Chen, L. C.;Chen, C. C.;Chen, K. H.;Lin, H.-J.;Lee, J. F.;Guo, J. H.
    贡献者: 淡江大學物理學系
    日期: 2006-05-01
    上传时间: 2009-11-04 17:18:26 (UTC+8)
    出版者: Melville: A I P Publishing LLC
    摘要: Nitrogen N and metal Al, Ga, and In K-edge x-ray absorption near-edge structure XANES , x-ray emission spectroscopy XES , and Raman scattering measurements were performed to elucidate the electronic structures of group-III–nitride nanorods and thin films of AlN, GaN, and InN. XANES spectra show slight increase of the numbers of unoccupied N p states in GaN and AlN nanorods, which may be attributed to a slight increase of the degree of localization of conduction band states. The band gaps of AlN, GaN, and InN nanorods are determined by an overlay of XES and XANES spectra to be 6.2, 3.5, and 1.9 eV, respectively, which are close to those of AlN and GaN bulk/films and InN polycrystals.
    關聯: Applied physics letters 88(22), pp.223113
    DOI: 10.1063/1.2207836
    显示于类别:[物理學系暨研究所] 期刊論文

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