淡江大學機構典藏:Item 987654321/125714
English  |  正體中文  |  简体中文  |  Items with full text/Total items : 64185/96959 (66%)
Visitors : 11771184      Online Users : 5425
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library & TKU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version
    Please use this identifier to cite or link to this item: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/125714


    Title: Microstructural evaluation of interfacial intermetallic compounds between Sn58Bi and ENEPIG
    Authors: Wang, Yi-wun;Tsai, Cheng-ting;Fang, Jang-cheng;Lin, Tzu-yi
    Date: 2024-04-17
    Issue Date: 2024-07-31 12:10:00 (UTC+8)
    Publisher: ELSEVIER
    Abstract: Background
    Low carbonization and Restriction of Hazardous Substances (RoHS) regulations have promoted the development of low-temperature lead-free solder. The solder and substrate are critical entities of joint connections.

    Methods
    Sn58Bi has been considered a promising low-temperature solder. Electroless nickel/electroless palladium/immersion gold (ENEPIG) is a good surface finish that prevents solder joints from oxidizing and extends the shelf life of the substrates. In this study, the interfacial reactions between the Sn58Bi solder and ENEPIG surface finish were systematically analyzed.

    Findings
    (Au,Pd,Ni)(Sn,Bi)4 was observed after reflow at 160 °C. Au and Pd dissolved into solder rapidly in the beginning. NiSn4 and Ni3Sn4 with small amounts of Au and Pd dissolution formed at the interface after aging. The morphology of NiSn4 evolved from block-like to needle-shaped and finally to a layered configuration as the aging temperature and time increase. Ni3Sn4 was observed between NiSn4 and substrate above 100 °C. This study established the growth mechanism of intermetallic compounds (IMCs) in the reaction between Sn58Bi and ENEPIG for low-carbon emitting processes.
    Relation: Journal of the Taiwan Institute of Chemical Engineers 159, 105508
    DOI: 10.1016/j.jtice.2024.105508
    Appears in Collections:[Graduate Institute & Department of Chemical and Materials Engineering] Journal Article

    Files in This Item:

    File Description SizeFormat
    index.html0KbHTML69View/Open

    All items in 機構典藏 are protected by copyright, with all rights reserved.


    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library & TKU Library IR teams. Copyright ©   - Feedback