Correlating the valence state with the adsorption behavior of a Cu-based electrocatalyst for furfural oxidation with anodic hydrogen production reaction

doi:10.1002/adma.202304203

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Title:	Correlating the valence state with the adsorption behavior of a Cu-based electrocatalyst for furfural oxidation with anodic hydrogen production reaction
Authors:	Ming Yang, Yingying Li, Chung-Li Dong, Shengkai Li, Leitao Xu, Wei Chen, Jingcheng Wu, Yuxuan Lu, Yuping Pan, Yandong Wu, Yongxiang Luo, Yu-Cheng Huang, Shuangyin Wang, Yuqin Zou
Date:	2023-06-24
Issue Date:	2024-07-30 12:05:56 (UTC+8)
Publisher:	Wiley-VCH
Abstract:	The low-potential furfural oxidation reaction (FFOR) on a Cu-based electrocatalyst can produce H2 at the anode, thereby providing a bipolar H2 production system with an ultralow cell voltage. However, the intrinsic activity and stability of the Cu-based electrocatalyst for the FFOR remain unsatisfactory for practical applications. This study investigates the correlation between the valence state and the adsorption behavior of the Cu-based electrocatalyst in furfural oxidation. Cu0 is the adsorption site with low intrinsic activity. Cu+, which exists in the form of Cu(OH)ads in alkaline electrolytes, has no adsorption ability but can improve the performance of Cu0 by promoting the adsorption of FF. Moreover, a mixed-valence Cu-based electrocatalyst (MV Cu) with high intrinsic activity and stability is prepared electrochemically. With the MV Cu catalyst, the assembled dual-side H2 production electrolyzer has a low electricity requirement of only 0.24 kWh mH2−3 at an ultralow cell voltage of 0.3 V, and it exhibits sufficient stability. This study not only correlates the valence state with the adsorption behavior of the Cu-based electrocatalyst for the low-potential FFOR with anodic H2 production but also reveals the mechanism of deactivation to provide design principles for Cu-based electrocatalysts with satisfactory stability.
Relation:	Advanced Materials 35(39), 2304203
DOI:	10.1002/adma.202304203
Appears in Collections:	[Graduate Institute & Department of Electrical Engineering] Journal Article

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