P/Si-TiO2 photocatalytic thick films on FTO glass substrates were prepared. TiO2 thin films, as base layer, were first coated on substrates using a spin-coating technique. The slurry containing P/Si-TiO2 nanoparticles was bar-coated on the surface of TiO2 base layer, followed by calcining at 550 °C. The resultant films were characterized using x-ray diffractometer, scanning electron microscope, UV–Vis spectrophotometer, crosscut adhesion test, and recycling-use test. Under 365-nm UV-light irradiation, abilities of the films to photocatalytically degrade methylene blue were evaluated. The apparent rate laws obeyed 1st-order and the corresponding reaction rate constants (k′), based on the coated area of substrates, were estimated. k′ of the thick film (thickness: 6.5 μm; composition: P/Si-TiO2 anatase crystallites with 16 nm average size) was 49.0 L/(m2-sub. h), which was about eight times of that of the thin film (k′ = 6.2 L/(m2-sub. h); thickness: 215 nm; composition: pure TiO2 anatase crystallites with 8-nm average size).
Relation:
Journal of Sol-Gel Science and Technology 97, p.259-270
