淡江大學機構典藏:Item 987654321/119545
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    Please use this identifier to cite or link to this item: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/119545


    Title: UV/H2O2及UV/SPS分解含四環素水溶液之反應行為研究
    Authors: 黃上權;陳俊成;申永順
    Keywords: 高級氧化程序;過氧化氫;過硫酸鹽;四環素
    Date: 2020-11-27
    Issue Date: 2020-11-11 12:12:03 (UTC+8)
    Abstract: 本次研究應用UV/H2O2及UV/SPS程序分解含四環素水溶液，對不同反應時間點之四環素去除率以HPLC分析，比較不同操作條件，並研究最佳四環素去除率。實驗結果顯示反應60分鐘後，四環素皆能達到100%去除，然UV/SPS系統之整體去除效率皆優於UV/H2O2系統。光強度於兩種氧化程序皆呈現強度愈強其去除四環素效果愈佳之趨勢，顯示提高UV光穿透水溶液之能力可更快促使氧化劑產生自由基以去除污染物。四環素初始濃度影響著UV光催化氧化劑之能力，高濃度的四環素間接導致氧化劑之催化反應受阻，使四環素之去除效率下降。pH於AOPs降解四環素中扮演著重要角色，研究結果顯示，利用UV/H2O2與UV/SPS系統降解四環素在pH為9之環境較為適宜。
    Appears in Collections:[Graduate Institute & Department of Water Resources and Environmental Engineering] Proceeding

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