Formation of BN-covered silicene on ZrB2/Si(111) by adsorption of NO and thermal processes

doi:10.1063/5.0011175

機構典藏 > College of Sciences > Graduate Institute & Department of Physics > Journal Article > Item 987654321/119078

Please use this identifier to cite or link to this item: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/119078

Title:	Formation of BN-covered silicene on ZrB2/Si(111) by adsorption of NO and thermal processes
Authors:	Yoshinobu, Jun;Mukai, Kozo;Ueda, Hiroaki;Yoshimoto, Shinya;Shimizu, Sumera;Koitaya, Takanori;Noritake, Hiroyuki;Lee, Chi-Cheng;Ozaki, Taisuke;Fleurence, Antoine;Friedlein, Rainer;Yukiko, Yamada-Takamura
Date:	2020-08-10
Issue Date:	2020-09-17 12:12:00 (UTC+8)
Abstract:	We have investigated the adsorption and thermal reaction processes of NO with silicene spontaneously formed on the ZrB2/Si(111) substrate using synchrotron radiation x-ray photoelectron spectroscopy (XPS) and density-functional theory calculations. NO is dissociatively adsorbed on the silicene surface at 300 K. An atomic nitrogen is bonded to three Si atoms most probably by a substitutional adsorption with a Si atom of silicene (N≡Si3). An atomic oxygen is inserted between two Si atoms of the silicene (Si—O—Si). With increasing NO exposure, the two-dimensional honeycomb silicene structure gets destroyed, judging from the decay of typical Si 2p spectra for silicene. After a large amount of NO exposure, the oxidation state of Si becomes Si4+ predominantly, and the intensity of the XPS peaks of the ZrB2 substrate decreases, indicating that complicated silicon oxinitride species have developed three-dimensionally. By heating above 900 K, the oxide species start to desorb from the surface, but nitrogen-bonded species still exist. After flashing at 1053 K, no oxygen species is observed on the surface; SiN species are temporally formed as a metastable species and BN species also start to develop. In addition, the silicene structure is restored on the ZrB2/Si(111) substrate. After prolonged heating at 1053 K, most of nitrogen atoms are bonded to B atoms to form a BN layer at the topmost surface. Thus, BN-covered silicene is formed on the ZrB2/Si(111) substrate by the adsorption of NO at 300 K and prolonged heating at 1053 K.
Relation:	The Journal of Chemical Physics 153, 064702
DOI:	10.1063/5.0011175
Appears in Collections:	[Graduate Institute & Department of Physics] Journal Article

Files in This Item:

File	Description	Size	Format
Formation of BN-covered silicene on ZrB2 Si(111) by adsorption of NO and thermal processes.pdf		3812Kb	Adobe PDF	3	View/Open
index.html		0Kb	HTML	91	View/Open

Loading...