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    題名: 以X光吸收光譜探討形狀記憶合金Ti50-xNi50+x之電子結構
    其他題名: X-ray absorption spectroscopy study of the electronic structure of the shape memory alloys Ti50-xNi50+x
    作者: 陳昱安;Chen, Yu-An
    貢獻者: 淡江大學物理學系碩士班
    張經霖;Chang, Ching-Lin
    關鍵詞: X光吸收光譜;形狀記憶合金;XANES;Shape Memory Alloys
    日期: 2016
    上傳時間: 2017-08-24 23:38:13 (UTC+8)
    摘要: 我們以X光吸收光譜對富鎳之鈦鎳合金Ti50-X Ni50+X (x=0,0.4,0.7,1.0,1.3,1.6)進行有系統之研究。從Ti L2,3 -edge譜中,我們發現L3的吸收峰強度,在x≤1低含量時依序的下降;但在x>1高含量時上升。而Ti 3d未占據態的變化趨勢與奧斯田體相電阻率及電子熱導率的走勢有一致性。從Ni L2,3 -edge譜中,我們發現L3的吸收峰強度,在x≤1低含量時有下降,Ni 3d未占據態的變化趨勢與麻田散體相電阻率的走勢有一致性;在x>1高含量時也是下降。從Ti 的K-edge譜中,主吸收峰只有在x=1.6強度較強,其他並無明顯的變化。從Ni 的K-edge譜中,譜形並無明顯變化,推測與熱電性質較無關聯。
    We have performed X-ray absorption near edge structure (XANES) to study the shape memory alloys Ti50-X Ni50+X (x=0,0.4,0.7,1.0,1.3,1.6). From Ti L2,3 -edge spectra, we find that L3 absorption intensity, at x≤1, decreases systematically. While, at higher Ni concentration (x>1), the L3 absorption intensity increases. The variation of Ti 3d unoccupied states correlates well with the electric resistivity and electronic thermal conductivity of austensit phase. From Ni L2,3 -edge spectra, we find that L3 absorption intensity, at x≤1 decreases systematically, The variation of Ni 3d unoccupied states correlates well with the electric resistivity of martensite phase. While, at higher Ni concentration (x>1), the L3 absorption intensity decreases. From Ti K–edge spectra, main absorption peak only at x=1.6 has strong intensity, other no obvious change. From Ni K–edge spectrum, no significant change in the spectral shape, speculate that no related with seekback effect.
    顯示於類別:[物理學系暨研究所] 學位論文

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