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    Please use this identifier to cite or link to this item: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/108310


    Title: Device and method for measuring distribution of atomic resolution deformation
    Authors: Jang, Bong Kyun;Kim, Jae-Hyun;Lee, Hak-Joo;Kim, Kyung-Suk;Wang, Chien-Kai
    Keywords: United States Patent, Patent Number 9,003,561
    Date: 2014-07
    Issue Date: 2016-11-24 09:41:26 (UTC+8)
    Abstract: The present invention relates to an atomic resolution deformation distribution measurement device that can measure a deformation rate of an atomic scale with low expense by improving resolution using an AFM system, and the atomic resolution deformation distribution measurement device includes: a laser source generating a laser beam; a first cantilever and a second cantilever provided close to a measurement specimen or a reference specimen to cause deformation by an atomic force; an optical system controlling a light path of the laser beam so as to cause the laser beam to be sequentially reflected to the first cantilever and the second cantilever and locate the first cantilever and the second cantilever to an image point; a measurement unit measuring the laser beam reflected from the second cantilever; and a stage on which a measurement specimen or a reference specimen is located and movable in X, Y, and Z axis directions.
    Appears in Collections:[土木工程學系暨研究所] 專利

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