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    Please use this identifier to cite or link to this item: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/108165

    Title: Iodide recovery from thin film transistor liquid crystal display plants by using potassium hydroxide - driven forward osmosis
    Authors: Nguyen, Nguyen Cong;Chen, Shiao-Shing;Weng, Yu-Ting;Thi Nguyen, Hau;Ray, Saikat Sinha;Li, Chi-Wang;Yan, Bin;Wang, Jing
    Keywords: Forward osmosis;Draw solution, Potassium hydroxide;Iodide recovery;Reuse
    Date: 2016-12-15
    Issue Date: 2016-11-02 02:10:51 (UTC+8)
    Publisher: Elsevier BV
    Abstract: For the first time, KOH in the waste stream of a thin film transistor liquid crystal displays (TFT-LCD) plant was utilized as a draw solution to recover iodide in the waste stream through forward osmosis (FO). In long-term operation, the pressure-retarded osmosis mode provided concentration efficiency greater than that of the FO mode. The maximum water flux achieved 11.7 LMH at pH 11 of KOH draw solution, and the iodide concentration reached 6.9% for reuse in TFT-LCD plant from the initial iodide concentration of 0.6% after 120 h. Analysis of scanning electron microscopy and energy dispersive X-ray spectroscopy images revealed a thin fouling cake layer of KI on the support layer of the membrane. The overall performance of the proposed FO system with KOH as the draw solution indicated that the FO system is promising for concentrating iodide for reuse in TFT-LCD plants. The proposed FO system offers excellent benefits: (1) the liquid discharge is minimal and (2) the cost of the FO system is extremely low because draw solution recovery is not required.
    Relation: Journal of Membrane Science 520, p.214-220
    DOI: 10.1016/j.memsci.2016.07.062
    Appears in Collections:[水資源及環境工程學系暨研究所] 期刊論文

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