Direct Patterning with Femtosecond Laser for Fabricating Ge2Sb2Te5 Stamps and Imprinting of UV Resins.

淡江大學機構典藏 > 工學院 > 機械與機電工程學系暨研究所 > 期刊論文 > Item 987654321/106088

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題名:	Direct Patterning with Femtosecond Laser for Fabricating Ge2Sb2Te5 Stamps and Imprinting of UV Resins.
作者:	Lin, C.B.;Cheng, Po-Yuan;Lino, Hung Yi
關鍵詞:	Phase transformation;Femtosecond Laser;Photomelting;Etching;Imprinting
日期:	2015-11-26
上傳時間:	2016-04-22 13:19:26 (UTC+8)
摘要:	A novel method to fabricate a micro-scaled meter metallic stamp for imprinting is proposed in this study. Phase transformation film of amorphous Ge2Sb2Te5 (GST) was first deposited on cleaned silicon substrates by using DC sputtering process. The GST film is then irradiated with the femtosecond laser pulse directly through the photomask to photomelt and induces 2D-crystalline marks formed on the original amorphous region. Owing to the varied chemical properties between the amorphous region and crystalline marks, the crystalline marks were etched by using nitric acid mixed with ethanol. It is with this method that a micro-scaled meter metallic stamp was fabricated. Furthermore, the SU-8 polymeric patterns were successfully replicated and easily demolded from the etched GST stamp by using imprinting. Ultimately, with imprinting, the etched GST stamp could successfully replicate and also easily demold the SU-8 polymeric patterns.
關聯:	Journal of Material Sciences & Engineering 5(1), 100215(6pages)
DOI:	10.4172/2169-0022.1000215
顯示於類別:	[機械與機電工程學系暨研究所] 期刊論文

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