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    Please use this identifier to cite or link to this item: https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/106088

    Title: Direct Patterning with Femtosecond Laser for Fabricating Ge2Sb2Te5 Stamps and Imprinting of UV Resins.
    Authors: Lin, C.B.;Cheng, Po-Yuan;Lino, Hung Yi
    Keywords: Phase transformation;Femtosecond Laser;Photomelting;Etching;Imprinting
    Date: 2015/11/26
    Issue Date: 2016-04-22 13:19:26 (UTC+8)
    Abstract: A novel method to fabricate a micro-scaled meter metallic stamp for imprinting is proposed in this study. Phase transformation film of amorphous Ge2Sb2Te5 (GST) was first deposited on cleaned silicon substrates by using DC sputtering process. The GST film is then irradiated with the femtosecond laser pulse directly through the photomask to photomelt and induces 2D-crystalline marks formed on the original amorphous region. Owing to the varied chemical properties between the amorphous region and crystalline marks, the crystalline marks were etched by using nitric acid mixed with ethanol. It is with this method that a micro-scaled meter metallic stamp was fabricated. Furthermore, the SU-8 polymeric patterns were successfully replicated and easily demolded from the etched GST stamp by using imprinting. Ultimately, with imprinting, the etched GST stamp could successfully replicate and also easily demold the SU-8 polymeric patterns.
    Relation: Journal of Material Sciences & Engineering 5(1), 100215(6pages)
    DOI: 10.4172/2169-0022.1000215
    Appears in Collections:[機械與機電工程學系暨研究所] 期刊論文

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