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    Please use this identifier to cite or link to this item: http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/105247

    Title: 磁性薄膜在外加磁場下的X光反射率研究
    Other Titles: X-ray reflectivity study of the magnetic thin films under the application of magnetic field
    Authors: 鄭嵩樺;Cheng, Song-Hua
    Contributors: 淡江大學物理學系碩士班
    杜昭宏;Du, Chao-Hung
    Keywords: 磁性薄膜;磁場;X光反射率;magnetic thin film;Magnetic Field;X-ray reflectivity
    Date: 2015
    Issue Date: 2016-01-22 14:51:23 (UTC+8)
    Abstract: 本實驗利用X光反射率與X光繞射實驗方法來研究磁性薄膜樣品Pd/Fe/Fe-silicide/Si在外加磁場中,其結構的變化情形。我們發現到在磁場作用下,反射光譜圖中由於薄膜層與層之間的差異所形成的建設性干涉條紋波形訊號,其週期性與強度等皆發生隨著外加磁場強度改變而變化的現象,反映出當外加磁場大於一定值時,磁性薄膜樣品的形貌、厚度與粗糙度等物理量會產生變化。因此推測當外加磁場作用在磁性薄膜樣品上,其鐵薄膜層部分形貌有可能發生重新排列的情形。
    Using X-ray reflectivity , we report the responses of the magnetic films under the application of magnetic field. A thin film sample of Pd/Fe/FeSi/Si was prepared for this study. Under the application of magnetic fields, we observed that the periodicity and the intensity of the fringes resulting from the constructive interference between the layers can be changed as the field strength exceeding a threshold value, suggesting the morphology, including the periodicity, thickness and roughness of the films have been changed by the applied fields. These changes are understood to be possibly caused by the re-arrangement of the Fe domains in the film by the fields
    Appears in Collections:[物理學系暨研究所] 學位論文

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