淡江大學機構典藏:Item 987654321/103120
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    题名: 奈米顆粒之背向散射光和光子奈米噴流的數值分析與實驗
    其它题名: Numerical Analysis and Experiment of Light Backscattering and Photonic Nanojet of Nanoparticles
    作者: 劉承揚
    贡献者: 淡江大學機械與機電工程學系
    关键词: 奈米顆粒;背向散射光;光子奈米噴流;Nanoparticle;light backscattering;photonic nanojet
    日期: 2012-08
    上传时间: 2015-05-19 13:43:39 (UTC+8)
    摘要: 隨著高科技產業的發展，為了提高產品的效率和品質，產品的各項製程都往微小化發展，例如半導體產業中的30 nm線寬製程、平面顯示器產業中面版內外部的微小缺陷、精密光學元件產業的表面及內部缺陷等，都需要高解析度且微型化的檢測設備，因為細微的製程缺陷或污染對產品的良率與效能都會造成嚴重的影響。想要觀察物體的表面形貌，使用光學顯微鏡是最方便的方式，但是因為繞射極限的影響，目前的光學顯微鏡無法觀察到奈米等級的表面形貌。在遠場光學中，若想要突破繞射極限而得到奈米級的影像則必須有效的收集和恢復消散波的光學資訊。 本計畫將自行推導背向散射光數值模型並進行實驗量測，用以探討奈米顆粒的光子奈米噴流現象。在理論方面，本計畫將採用米氏散射交互影響模型來推導和計算奈米顆粒的背向散射光之角度相依性，並使用時域有限差分法來模擬奈米顆粒的光子奈米噴流之光場分佈和光場強度的增益作用。在實驗方面，本計畫將自行規劃、設計和架設一套三維散射光偵測儀來量測由奈米顆粒所發出的背向散射光和光子奈米噴流之光場分佈圖，此研究結果將可有效解決高科技產業中奈米等級的影像量測問題，例如線寬、微粒、光柵、甚至單分子等之量測。
    A major concern to the high technology industry for surface qualities is the detection of nanoscale surface characterization on silicon wafers. The optical inspection instruments with high resolution and sensitivity are required for semiconductor industry, flat panel display industry and precision optical components industry. The diffraction limit of lightwave, which is caused by the loss of evanescent waves in the far field that carry high spatial frequency information, limits the resolution of optical microscope to the order of wavelength of lightwave used to image the object. Projecting a diffraction limited image into the far field would require recovery of the evanescent waves. In this proposal, we will survey the evidence of localized photonic nanojet generated at the shadow side surfaces of dielectric particles illuminated by a plane wave in numerical analysis and experiment. Theoretical calculation based on the Mie scattering double interaction model describes the angular dependence of light backscattering of nanoparticles. Using finite difference time domain numerical modeling, we will analyze that photonic nanojets have waists smaller than the diffraction limit. In experiment, we will develop a three-dimensional light scattering measurement instrument for detecting light backscattering and photonic nanojet of the nanoparticles. Exploitation of this knowledge may provide a new ultra-microscopy technique for using visible lightwave to detect and image nanoscale characterizations such as line width, particles, grating, and even single molecules.
    显示于类别:[機械與機電工程學系暨研究所] 研究報告

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