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    <title>DSpace collection: 專利</title>
    <link>https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/800</link>
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      <title>以施工流程爲基礎之建築施工流程管理系統及其方法</title>
      <link>https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/118430</link>
      <description>title: 以施工流程爲基礎之建築施工流程管理系統及其方法 abstract: 一種以施工流程為基礎之建築施工流程管理系統，係包含:一設定模組，係包含一施工&#xD;
流程管理介面，該施工流程管理介面用以根據施工流程建立複數個基本工作項目，並根 據一編碼規則進行編碼以提供一唯一工程編碼給各個該基本工作項目，使各個該基本工 作項目具有施工流程及該唯一工程編碼;一資料庫，係與該設定模組連接，並儲存該些 基本工作項目及其施工流程;以及一專案管理模組，係與該資料庫連接，並用以由該些 基本工作項目中選擇至少一部份以建立複數專案工作項目以形成一工程專案，使該工程 專案之該些專案工作項目對應於至少一部分的該些基本工作項目，藉此供一使用者能根 據該些專案工作項目之施工流程管理該工程專案。
&lt;br&gt;description: I659368
&lt;br&gt;</description>
      <pubDate>Sat, 28 Mar 2020 04:11:24 GMT</pubDate>
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      <title>可提升抗拉拔強度的耐震型土釘</title>
      <link>https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/118391</link>
      <description>title: 可提升抗拉拔強度的耐震型土釘 abstract: 一種可提升抗拉拔強度的耐震型土釘，適用於固定一具有一坡面的邊坡土壤，該可提升抗拉拔強度的耐震型土釘包含一桿件、一阻抗單元、一第一承壓鈑，及一螺帽。該桿件沿一軸線延伸並包括一插設於該邊坡土壤的插入段，及一沿該軸線連接於該插入段且突出該坡面的突出段，該突出段的一外周面形成有一外螺紋。該阻抗單元繞設於該桿件的插入段，並包括至少一繞設於該插入段的阻抗件，及至少一連接該阻抗件且固接於該插入段的連接件。該第一承壓鈑套設於該突出段並壓設於該坡面。該螺帽螺鎖於該突出段並朝坡面的方向迫緊該第一承壓鈑。利用該阻抗件與土壤及混凝土砂漿間的結合力，而可提升整體的抗拉拔及耐震強度。
&lt;br&gt;description: 專利證號：新型第M558814號
&lt;br&gt;</description>
      <pubDate>Tue, 24 Mar 2020 04:10:33 GMT</pubDate>
    </item>
    <item>
      <title>高性能土釘</title>
      <link>https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/118390</link>
      <description>title: 高性能土釘 abstract: 一種高性能土釘包含一釘桿及數節瘤。該等節瘤間隔套置於該釘桿，每一節瘤的最大外徑為d，並包括沿該釘桿的長度方向反向設置的一第一端及一第二端，每兩相鄰的該等節瘤的其中一該節瘤的第二端鄰近於另一該節瘤的第一端，並相隔一間隙x，且2d ≤ x ≤3d。藉由將該等節瘤間隔套置於該釘桿，能夠減少該等節瘤的數量而達到降低製造成本的效果，且經由測試結果可知，當2d ≤ x ≤3d時，能提高尖峰拉出力，而提升穩定邊坡的功效。
&lt;br&gt;description: 專利證號：新型第M587183號
&lt;br&gt;</description>
      <pubDate>Tue, 24 Mar 2020 04:10:30 GMT</pubDate>
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    <item>
      <title>System and Method for Measuring Distribution of Deformation using Atomic Force</title>
      <link>https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/111749</link>
      <description>title: System and Method for Measuring Distribution of Deformation using Atomic Force abstract: The present invention relates to an apparatus to measure distribution of deformation using an atomic force to measure a deformation rate of atomic scale with high resolution at low costs. The apparatus comprises: a laser light source which generates a laser beam; a first cantilever and a second cantilever close to a measurement sample or a reference sample to generate deformation due to an atomic force; an optical system which successively reflects the laser beam on the first cantilever and the second cantilever, controlling an optical path of the laser beam to arrange the first cantilever and the second cantilever in a position of a store; an observation part which observes the laser beam reflected on the second cantilever; and a stage placed on the measurement sample or the reference sample, moving to three axial directions of X, Y, and Z.COPYRIGHT KIPO 2016
&lt;br&gt;description: 專利證號：Korea Patent, Patent Number 10-1633648
&lt;br&gt;</description>
      <pubDate>Mon, 25 Sep 2017 18:10:21 GMT</pubDate>
    </item>
    <item>
      <title>Device and method for measuring distribution of atomic resolution deformation</title>
      <link>https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/111748</link>
      <description>title: Device and method for measuring distribution of atomic resolution deformation abstract: The present invention relates to an atomic resolution deformation distribution measurement device that can measure a deformation rate of an atomic scale with low expense by improving resolution using an AFM system, and the atomic resolution deformation distribution measurement device includes: a laser source generating a laser beam; a first cantilever and a second cantilever provided close to a measurement specimen or a reference specimen to cause deformation by an atomic force; an optical system controlling a light path of the laser beam so as to cause the laser beam to be sequentially reflected to the first cantilever and the second cantilever and locate the first cantilever and the second cantilever to an image point; a measurement unit measuring the laser beam reflected from the second cantilever; and a stage on which a measurement specimen or a reference specimen is located and movable in X, Y, and Z axis directions.
&lt;br&gt;description: 專利證號：US9003561 B1
&lt;br&gt;</description>
      <pubDate>Mon, 25 Sep 2017 18:10:19 GMT</pubDate>
    </item>
    <item>
      <title>System and Method for Measuring Distribution of Deformation using Atomic Force</title>
      <link>https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/110344</link>
      <description>title: System and Method for Measuring Distribution of Deformation using Atomic Force abstract: The present invention relates to an apparatus to measure distribution of deformation using an atomic force to measure a deformation rate of atomic scale with high resolution at low costs. The apparatus comprises: a laser light source which generates a laser beam; a first cantilever and a second cantilever close to a measurement sample or a reference sample to generate deformation due to an atomic force; an optical system which successively reflects the laser beam on the first cantilever and the second cantilever, controlling an optical path of the laser beam to arrange the first cantilever and the second cantilever in a position of a store; an observation part which observes the laser beam reflected on the second cantilever; and a stage placed on the measurement sample or the reference sample, moving to three axial directions of X, Y, and Z.COPYRIGHT KIPO 2016
&lt;br&gt;description: Korea Patent, Patent Number 10-1633648
&lt;br&gt;</description>
      <pubDate>Thu, 01 Jun 2017 18:11:14 GMT</pubDate>
    </item>
    <item>
      <title>Device and method for measuring distribution of atomic resolution deformation</title>
      <link>https://tkuir.lib.tku.edu.tw/dspace/handle/987654321/108310</link>
      <description>title: Device and method for measuring distribution of atomic resolution deformation abstract: The present invention relates to an atomic resolution deformation distribution measurement device that can measure a deformation rate of an atomic scale with low expense by improving resolution using an AFM system, and the atomic resolution deformation distribution measurement device includes: a laser source generating a laser beam; a first cantilever and a second cantilever provided close to a measurement specimen or a reference specimen to cause deformation by an atomic force; an optical system controlling a light path of the laser beam so as to cause the laser beam to be sequentially reflected to the first cantilever and the second cantilever and locate the first cantilever and the second cantilever to an image point; a measurement unit measuring the laser beam reflected from the second cantilever; and a stage on which a measurement specimen or a reference specimen is located and movable in X, Y, and Z axis directions.
&lt;br&gt;description: 專利證號：United States Patent, Patent Number 9,003,561
&lt;br&gt;</description>
      <pubDate>Thu, 24 Nov 2016 01:41:26 GMT</pubDate>
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